a) forming a polymer matrix that is both repellent and antiadhesive to atmospheric pollutant molecules, by means of a first biocompatible polymer (BP1);b) under the effect of UV radiation, photocatalytically degrading the pollutant molecules that have penetrated into the polymer matrix by means of first semiconductor colloids (Col-1) grafted covalently with a second biocompatible polymer (BP2), thereby leading to formation of free radicals;c) neutralizing said free radicals by means of at least 2 antioxidants, namely: a first antioxidant in the form of second semiconductor colloids (Col-2) grafted covalently with said first antioxidant (AntiOx-1); the second grafted colloids (Col-2) self-regenerating under the action of the UV radiation; anda second antioxidant (AntiOx-2) that is not in the form of colloids grafted with an antioxidant; andd) stabilizing the polymer matrix by means of the second antioxidant (AntiOx-2)."/> METHOD FOR TOPICAL PROTECTION AGAINST ATMOSPHERIC POLLUTANT MOLECULES AND/OR FREE RADICALS PRODUCED BY EXPOSURE TO ULTRAVIOLET RADIATION
首页> 外国专利> METHOD FOR TOPICAL PROTECTION AGAINST ATMOSPHERIC POLLUTANT MOLECULES AND/OR FREE RADICALS PRODUCED BY EXPOSURE TO ULTRAVIOLET RADIATION

METHOD FOR TOPICAL PROTECTION AGAINST ATMOSPHERIC POLLUTANT MOLECULES AND/OR FREE RADICALS PRODUCED BY EXPOSURE TO ULTRAVIOLET RADIATION

机译:通过暴露于紫外线辐射产生的大气污染物分子和/或自由基的局部保护方法

摘要

A method of providing topical protection against atmospheric pollutant molecules and against ultraviolet (UV) radiation, said method comprising the steps of:a) forming a polymer matrix that is both repellent and antiadhesive to atmospheric pollutant molecules, by means of a first biocompatible polymer (BP1);b) under the effect of UV radiation, photocatalytically degrading the pollutant molecules that have penetrated into the polymer matrix by means of first semiconductor colloids (Col-1) grafted covalently with a second biocompatible polymer (BP2), thereby leading to formation of free radicals;c) neutralizing said free radicals by means of at least 2 antioxidants, namely: a first antioxidant in the form of second semiconductor colloids (Col-2) grafted covalently with said first antioxidant (AntiOx-1); the second grafted colloids (Col-2) self-regenerating under the action of the UV radiation; anda second antioxidant (AntiOx-2) that is not in the form of colloids grafted with an antioxidant; andd) stabilizing the polymer matrix by means of the second antioxidant (AntiOx-2).
机译:提供抵抗大气污染物分子和抗紫外线(UV)辐射的局部保护的方法,所述方法包括以下步骤: <列表项ID = “ul0001-0001” 号= “0000”> <列表项ID = “ul0002-0001”号=“0000”> a)形成,既驱除剂和抗粘附到大气污染物分子,由第一生物相容性聚合物(BP1)的装置的聚合物基质; <列表项ID =“ul0002-0002”号码=” 0000" > b)的紫外线辐射的作用下,光催化降解已通过与第二生物相容的聚合物(BP2)共价接枝第一半导体胶体(的Col-1)的手段渗透到聚合物基质中的污染物分子,从而导致形成的自由基; <列表项ID =“ul0002-0003”号=“0000”> C)中和所述至少2种抗氧化剂,即手段自由基: <列表项ID = “ul0003-0001” 号= “0000”>中的具有共价接枝的第二半导体胶体(的Col-2)的形式的第一抗氧化剂,所述第一抗氧化剂(的Antiox-1);第二接枝胶体(的Col-2)的紫外线辐射的作用下自我再生;和 <列表项ID =“ul0003-0002”号=“0000”>第二抗氧化剂(的Antiox-2),其不与抗氧化剂接枝的胶体的形式;和 <列表项ID = “ul0002-0004” 号= “0000”> d)由所述第二抗氧化剂的装置稳定在聚合物基体(的Antiox-2)。

著录项

  • 公开/公告号US2021251861A1

    专利类型

  • 公开/公告日2021-08-19

    原文格式PDF

  • 申请/专利权人 BIONUCLEI;

    申请/专利号US201917251050

  • 发明设计人 HAN ATHALIN;JEAN-NOËL THOREL;

    申请日2019-06-03

  • 分类号A61K8/27;A61K8/29;A61Q17/04;A61K8/73;A61K8/34;A61K8/81;A61K8/368;

  • 国家 US

  • 入库时间 2022-08-24 20:42:09

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