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Wet clean solutions to prevent pattern collapse
Wet clean solutions to prevent pattern collapse
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机译:湿干净的解决方案,以防止图案崩溃
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摘要
A method for implementing a wet clean process includes cleaning one or more trenches formed in an interlevel dielectric by applying a two-phase cleaning solution. Applying the two-phase cleaning solution includes applying a first component of the two-phase cleaning solution including a diluted acid solution, and reducing capillary force during drying by applying a second component of the two-phase cleaning solution including a chemistry that is less dense than the first component.
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