首页> 外国专利> METHOD OF QUALITY DETERMINING OF DEPOSITION MASK, METHOD OF MANUFACTURING DEPOSITION MASK, METHOD OF MANUFACTURING DEPOSITION MASK DEVICE, METHOD OF SELECTING DEPOSITION MASK AND DEPOSITION MASK

METHOD OF QUALITY DETERMINING OF DEPOSITION MASK, METHOD OF MANUFACTURING DEPOSITION MASK, METHOD OF MANUFACTURING DEPOSITION MASK DEVICE, METHOD OF SELECTING DEPOSITION MASK AND DEPOSITION MASK

机译:沉积掩模的质量确定方法,制造沉积掩模的方法,制造沉积掩模装置的方法,选择沉积掩模和沉积掩模的方法

摘要

A method of quality determination of a deposition mask according to the present disclosure includes: a measuring step that measures a dimension X1 from a P1 point to a Q1 point, and a dimension X2 from a P2 point to a Q2 point; and a determining step that determines a quality of a deposition mask, based on the dimension X1 and the dimension X2 measured in the measuring step.
机译:根据本公开的沉积掩模的质量测定方法包括:测量步骤,其测量从P 1的尺寸x 1 点到q 1 点,和尺寸x 2 从p 2 点到q 2 点;并且基于测量步骤中测量的尺寸x 1和尺寸x 2 确定沉积掩模的质量的确定步骤。

著录项

  • 公开/公告号US2021242405A1

    专利类型

  • 公开/公告日2021-08-05

    原文格式PDF

  • 申请/专利权人 DAI NIPPON PRINTING CO. LTD.;

    申请/专利号US202117142582

  • 发明设计人 CHIKAO IKENAGA;

    申请日2021-01-06

  • 分类号H01L51;C23C14/04;G03F7;G06T7;H01L51/56;

  • 国家 US

  • 入库时间 2022-08-24 20:20:16

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