METHOD FOR MANUFACTURING INFRARED CUT-OFF FILTER, FILTER FOR SOLID-STATE IMAGING ELEMENT, AND SOLID-STATE IMAGING ELEMENT

摘要

The present invention includes: forming an infrared cut-off layer containing an infrared absorbing pigment; forming a protective layer against a peeling solution on the infrared cut-off layer; forming a resist pattern on the protective layer; patterning the protective layer and the infrared cut-off layer through dry etching by using the resist pattern; and peeling the resist pattern from the protective layer by using the peeling solution.