Equipment for chemical vapour separation with a nozzle, for positive regulation of the injection rate of reactive gases and procedures for

摘要

Chemical vapour separation (CVD) procedure with a spray head (100) by which a reactive gas of at least one type and a rinse gas is injected via a substrate arranged in a reaction chamber to separate a film on the substrate-Arrange the nozzle head (100) in such a way that the underside of the nozzle (100) is suspended from the substrate by a predetermined line;Separate supply of a reactive gas and a carrier gas in separate chambers of the nozzle (100), mixing the reactive gas and the carrier gas from each chamber subsequently in a mixing zone (777), which is formed on the inside of the nozzle (100) in such a way that the reactive gas is mixed with the injection carrier gas in the mixing zone (777) on the inside of the nozzle (100);-Insert a washing gas into a separate chamber, which is formed on the inside of the nozzle (100); andInjecting the reactive gas mixed with the injection carrier and the rinse gas through a variety of reactive gas outlets and/or a variety of flushing outlets (446) that are formed at the bottom of the nozzle (100).