首页> 外国专利> METHOD AND SYSTEM FOR DETERMINING AND CONTROLLING THE SEPARATION DISTANCE BETWEEN A WORKING HEAD OF A LASER PROCESSING MACHINE AND THE SURFACE OF AN OBJECT BEING PROCESSED BY MEANS OF LOW COHERENCE OPTICAL INTERFEROMETRY TECHNIQUES

METHOD AND SYSTEM FOR DETERMINING AND CONTROLLING THE SEPARATION DISTANCE BETWEEN A WORKING HEAD OF A LASER PROCESSING MACHINE AND THE SURFACE OF AN OBJECT BEING PROCESSED BY MEANS OF LOW COHERENCE OPTICAL INTERFEROMETRY TECHNIQUES

机译:用于确定和控制激光加工机的工作头和通过低相干光学干涉技术处理的物体的表面之间的分离距离的方法和系统

摘要

A method and a system are described for determining and controlling the separation distance between a processing head of a machine tool and the surface of a material, comprising: - generating a measurement low coherence optical radiation beam, leading the measurement beam towards the material and leading the reflected or diffused measurement beam from the surface of the material towards an optical interferometric sensor arrangement in a first direction of incidence, - generating a reference low coherence optical radiation beam, and leading the reference beam towards the optical interferometric sensor arrangement in a second direction of incidence at a preset angle of incidence with respect to the first direction of incidence of the measurement beam; - superimposing the measurement beam and the reference beam on a common region of incidence of the sensor arrangement; - detecting the position of a pattern of interference fringes between the measurement beam and the reference beam on the region of incidence; and - determining a difference in optical length between the measurement optical path and the reference optical path on the basis of the position of the pattern of interference fringes along an illumination axis of the region of incidence, which is indicative of a difference between (a) the current separation distance between the working head and the surface of the material and (b) a predetermined nominal separation distance.
机译:描述了一种方法和系统,用于确定和控制机床的处理头和材料表面之间的分离距离,包括:产生测量低相干光辐射束,导致测量光束朝向材料和前导从材料表面朝向光学干涉传感器布置的反射或扩散梁在第一入射方向上,产生参考低相干光辐射束,并在第二方向上向光学干涉传感器布置引导参考光束关于测量光束的第一入射方向的预设入射角的入射; - 在传感器装置的公共发生区域上叠加测量光束和参考光束; - 检测在入射区域上测量光束和参考光束之间的干涉条纹的图案的位置;基于入射区域的照明轴的干涉条纹的图案的位置,确定测量光路与参考光路之间的光学长度差异,这表示(a)之间的差异工作头和材料表面之间的电流分离距离和(B)预定的标称分离距离。

著录项

  • 公开/公告号WO2021111423A1

    专利类型

  • 公开/公告日2021-06-10

    原文格式PDF

  • 申请/专利权人 ADIGE S.P.A.;

    申请/专利号WO2020IB61581

  • 申请日2020-12-07

  • 分类号G01B9/02;B23K26/03;

  • 国家 IB

  • 入库时间 2022-08-24 19:17:40

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