A method for pretreating surfaces for coating

摘要

Exposing the substrate to a rare gas ion selected from the group of metal ions and argon ions, krypton ions, neon ions, xenon ions and helium ions in a vacuum chamber (10); and negative electrical potential on the substrate (1) A method for pretreating a substrate (200) for surface coating by applying (P1, P2), wherein the substrate (200) is pretreated in at least two steps (1000, 2000); These steps are performed sequentially in the vacuum chamber (10), and the first step (1000) is performed from the group of argon ions, krypton ions, neon ions, xenon ions and helium ions in the vacuum chamber (10). Supplying a plasma mainly containing selected rare gas ions, and a substrate ( 00) applying a first negative electrical potential (P1) onto the second step (2000) supplying a plasma mainly comprising metal ions in the vacuum chamber (10); Applying a second negative electric potential (P2) on the substrate (200), wherein the first negative electric potential (P1) is lower than the second electric potential (P2). Applying a potential (P2), the method for pretreating a substrate (200) for surface coating, wherein the magnitude of the first negative potential (P1) is 100-1500V. [Selection] Figure 1