首页> 外国专利> VARIABLE ELECTRODE FRAME FOR ELECTRO POLISHING, FIXING MEMBER OF ELECTRODE FRAME FOR ELECTRO POLISHING AND ELECTRO POLISHING APPARATUS INCLUDING THE SAME

VARIABLE ELECTRODE FRAME FOR ELECTRO POLISHING, FIXING MEMBER OF ELECTRODE FRAME FOR ELECTRO POLISHING AND ELECTRO POLISHING APPARATUS INCLUDING THE SAME

机译:用于电极抛光的可变电极框架,电极框架的固定构件包括相同的电抛光和电抛光装置

摘要

The variable electrode frame according to the embodiment includes a first cathode plate disposed in a first direction and composed of a plurality of supports, and a second cathode plate disposed in a second direction forming a predetermined angle with the first direction and composed of a plurality of supports. Including, the first negative plate includes a first support and a second support, and the first support may be moved in a direction away from or closer to the second support while partially overlapping the second support. have.
机译:根据该实施例的可变电极框架包括在第一方向上设置的第一阴极板,并且由多个支撑件构成,并且第二阴极板以第二方向设置在第一方向上,形成预定角度,并且由多个方向构成支持。包括,第一负极板包括第一支撑件和第二支撑件,并且第一支撑件可以在部分重叠第二支撑件的同时在远离或更靠近第二支撑件的方向上移动。有。

著录项

  • 公开/公告号KR102250005B1

    专利类型

  • 公开/公告日2021-05-07

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR1020180036237

  • 发明设计人 황재상;

    申请日2018-03-29

  • 分类号C25F7;C25F3/16;

  • 国家 KR

  • 入库时间 2022-08-24 18:46:35

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