首页> 外国专利> PREPARATION METHOD FOR AROMATIC AMIDE FRAGMENT EMBEDDED HYDROPHILIC AND HYDROPHOBIC MOLECULE SELF-ASSEMBLED MICELLE, AND PREPARATION METHOD FOR SUPRAMOLECULAR PHOTOCATALYTIC ASSEMBLY

PREPARATION METHOD FOR AROMATIC AMIDE FRAGMENT EMBEDDED HYDROPHILIC AND HYDROPHOBIC MOLECULE SELF-ASSEMBLED MICELLE, AND PREPARATION METHOD FOR SUPRAMOLECULAR PHOTOCATALYTIC ASSEMBLY

机译:芳族酰胺片段嵌入式亲水性和疏水分子自组装胶束的制备方法,以及超分子光催化组件的制备方法

摘要

A construction unit head-body-tail three-section amphiphilic molecule of an aromatic amide fragment embedded hydrophilic and hydrophobic molecule self-assembled micelle, a preparation method for forming a water-phase ultra-uniform round micelle assembly by the construction unit, and a preparation method for a supramolecular photocatalytic assembly. According to the three-section amphiphilic molecule, an aromatic amide oligomer fragment is embedded into a conventional hydrophilic and hydrophobic molecule. The supramolecular photocatalytic assembly is prepared by carrying out a reaction on the prepared aromatic amide fragment embedded hydrophilic and hydrophobic molecule self-assembled micelle and a catalyst in a water-phase sacrificial reagent. The aromatic amide fragment embedded hydrophilic and hydrophobic molecule self-assembled micelle has extremely high chemical and structural stability in water, is ultra-uniform and monodisperse and has controllable particle size. The supramolecular photocatalytic assembly is suitable for producing hydrogen by reducing water phase protons under atmospheric atmosphere at normal temperature and normal pressure and selectively reducing carbon dioxide to prepare CO and CH4 under normal temperature and normal pressure in a carbon dioxide atmosphere, and does not contain noble metals.
机译:芳香族酰胺片段嵌入亲水和疏水分子自组装胶束的结构单元头部三段两段两亲子分子,一种制备结构单元的水相超长均匀圆形胶束组件的制备方法,以及超分子光催化组件的制备方法。根据三段两亲分子,将芳族酰胺低聚物片段嵌入常规亲水和疏水分子中。通过在水相牺牲试剂中进行制备的芳族酰胺片段嵌入的亲水和疏水分子的反应,通过在水相牺牲试剂中进行反应来制备超分子光催化组件。芳香族酰胺片段包埋的亲水性和疏水分子自组装胶束在水中具有极高的化学和结构稳定性,是超均匀的和单分散的,具有可控的粒度。超分子光催化组件适用于在常温和常压下在大气气氛下减少水相质子并选择性地减少二氧化碳以制备CO和CH 4 /亚碳的常规压力下的水相二氧化物气氛,不含贵金属。

著录项

  • 公开/公告号WO2021088310A1

    专利类型

  • 公开/公告日2021-05-14

    原文格式PDF

  • 申请/专利权人 THINKDO TECHNOLOGY LTD.;

    申请/专利号CNCN2020/083725

  • 发明设计人 TIAN JIA;XIANG DECHENG;ZHANG YIFAN;

    申请日2020-04-08

  • 分类号C08G69/12;C08G69;B01J31/22;

  • 国家 CN

  • 入库时间 2022-08-24 18:42:36

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