首页> 外国专利> Method of Manufacturing Planar Multi-electrode Array Using Laser Patterning and Photosensitive Polymer Insulating Film

Method of Manufacturing Planar Multi-electrode Array Using Laser Patterning and Photosensitive Polymer Insulating Film

机译:使用激光图案化和光敏聚合物绝缘膜制造平面多电极阵列的方法

摘要

A method of manufacturing a planar multi-electrode array using laser patterning and a photosensitive polymer insulating film according to an embodiment of the present invention includes: performing a conductor patterning process using a laser on a first substrate on which a conductor is deposited; Performing an insulation process by a photolithography process using an insulation material on the conductor patterned first substrate; And electrodepositing a platinum black solution or an iridium oxide solution to a plurality of recording electrodes and reference electrodes with open sites.
机译:一种使用激光图案化的平面多电极阵列的制造方法和根据本发明的实施例的光敏聚合物绝缘膜包括:使用在沉积导体的第一基板上使用激光进行导体图案化工艺;通过使用导体上的第一基板上的绝缘材料进行光刻工艺进行绝缘过程;并将铂黑溶液或氧化铱溶液电涂覆到多个记录电极和具有开放部位的参考电极。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号