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SYSTEM AND METHOD FOR REDUCING PRINTABLE DEFECTS ON EXTREME ULTRAVIOLET PATTERN MASKS
SYSTEM AND METHOD FOR REDUCING PRINTABLE DEFECTS ON EXTREME ULTRAVIOLET PATTERN MASKS
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机译:减少极端紫外线图案面罩上可打印缺陷的系统和方法
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摘要
A system for reducing printable defects on a pattern mask is disclosed. The system includes a controller configured to be communicatively coupled to a characterization sub-system, the controller including one or more processors configured to execute program instructions causing the one or more processors to: direct the characterization sub-system to perform inspection of a mask blank; generate a cost function based on a first characteristic and a second characteristic, the first characteristic comprising areas of defect regions exposed by mask patterns, the second characteristic comprising pattern complexity of a design pattern; determine one or more values indicative of a minimum of the cost function via a non-linear optimization procedure; and generate one or more control signals to adjust rotation and translation of the mask blank relative to the design pattern based on the determined one or more values indicative of the minimum of the cost function.
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