首页> 外国专利> Wavelength control system for pulse-by-pulse wavelength target tracking in DUV light sources

Wavelength control system for pulse-by-pulse wavelength target tracking in DUV light sources

机译:DuV光源脉冲波长目标跟踪波长控制系统

摘要

Wafer positioning errors in stepper scanners contribute to imaging defects. By changing the wavelength of the light generated by the light source, a wafer position error in the Z direction can be compensated. The real-time z-position of the wafer is determined, and changes in wavelength targets to offset this error are communicated to the light source. The light source, in addition to receiving the newly specified laser wavelength target for the subsequent laser pulse burst, pulse-by-pulse for the subsequent pulse in the current pulse burst, in feed-forward operation, and with the existing feedback operation. In the combined embodiment, this change in wavelength target is used. [Selection diagram] Fig. 4
机译:步进扫描仪中的晶圆定位误差有助于成像缺陷。通过改变由光源产生的光的波长,可以补偿Z方向上的晶片位置误差。确定晶片的实时Z位置,并且波长目标的变化将该误差偏移到光源。除了接收后续激光脉冲突发的新指定的激光波长目标之外,对于当前脉冲突发的后续脉冲的脉冲逐脉冲,在前馈操作中,以及现有的反馈操作。在组合实施例中,使用该波长靶的这种变化。 [选择图]图4

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