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Particle beam system and method for current regulation of single particle beams

机译:单粒子束电流调节的粒子束系统和方法

摘要

A particle beam system comprising: at least one particle source (Q) which is configured to generate a charged particle beam; a first multi-lens array (MLA1) which has a first plurality of individually adjustable and focusing particle lenses and which is arranged in the beam path of the particles in such a way that at least some particles pass through openings of the multi-lens array in the form of several individual particle beams (S1, S2, S3); a second multi-aperture plate (PA2) which has a plurality of second openings and which is arranged in the beam path of the particles after the first multi-lens array (MLA1) and in such a way that particles which pass through the first multi-lens array (MLA1) partially hit the second multi-aperture plate (PA2) and there are absorbed and partially penetrate the openings of the second multi-aperture plate (PA2); anda controller (550) which is set up to supply an individually adjustable voltage to the particle lenses of the first multi-lens array (MLA1) and thus to set the focusing of the associated particle lens individually for each individual particle beam (S1, S2, S3).
机译:粒子束系统,包括:至少一个颗粒源(Q),其被配置为产生带电粒子束;具有第一多透镜阵列(MLA1),其具有第一多个可单独调节和聚焦的粒子透镜,并且其以这样的方式布置在颗粒的光束路径中,使得至少一些粒子通过多透镜阵列的开口以几个单独的粒子束的形式(S1,S2,S3);具有多个第二开口的第二多孔板(PA2),并且在第一多透镜阵列(MLA1)之后的颗粒的光束路径中布置在颗粒的光束路径中,并且以使通过第一多的粒子-Lens阵列(MLA1)部分撞击第二多孔板(PA2),并且被吸收并部分地穿透第二多孔板(PA2)的开口; AndA控制器(550)设置为向第一多透镜阵列(MLA1)的粒子透镜提供可单独调节的电压,从而为每个单独的粒子束单独设置相关粒子镜头的聚焦(S1,S2 ,s3)。

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