DETECTION OF AN ELECTRIC ARC HAZARD RELATED TO A WAFER

摘要

A method, a non-transitory computer readable medium, and a detection system are provided for detecting an electric arc hazard associated with a wafer. The detection system may include a measurement unit, an electrode, and a processing unit. The measurement unit may be configured to provide a measurement result by measuring the electrical parameters of the electrode during the test period, during which the wafer can be moved relative to the electrode, and during that test period, a specific electric field between the electrode and the wafer A specific electric field, which may be formed between, induces the detached ends of the partially detached conductive elements of the wafer to move away from the wafer. The processing unit may be configured to determine the presence of an electric arc hazard based on the measurement result.