Problem to be solved: to provide a photocurable resin composition set which is excellent in separation at the above two interfaces and excellent in water solubility and formability, including the material for the model material and the support material.Solution for a model material containing a nonaqueous monomer (a) and a photopolymerization initiator (b)AndContains support materials that include water-soluble ethylenic unsaturated monomer (c) and photopolymerization initiator (d);A photocurable resin composition set;The difference. Delta.. gamma. Between the surface tension. Gamma. M of the composition for the model material and the surface tension. Gamma. S of the composition for the support material.The Hansen solubility parameter distance HSPD satisfies the following conditions (1) or (2).(1) the HSPD. GGE. ≧. Model material composition of the Hansen lysozyme radius R - 0.79. Delta.. gamma. + 10.9. Ltoreq. HSPD. Ltoreq. 0.79. Delta.. gamma. + 16.9, and (2) HSPD <. Delta.gamma < 0, and HSPD GGE - 0.67. Delta.. gamma. + 9.8.Diagram
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