Polymerization inhibitor-containing urethane (meth) acrylate oligomer photocurable artificial nail composition

摘要

PROBLEM TO BE SOLVED: To provide an artificial nail composition that is resistant to color fading and discoloration and gives a coat that can be used as long as possible.SOLUTION: A photocurable artificial nail composition contains a urethane (meth) acrylate oligomer, a tri-functional or higher (meth) acrylic monomer, a photopolymerization initiator and a dye and further contains a quinone compound-based polymerization inhibitor of 500-5000 ppm.SELECTED DRAWING: None