首页> 外国专利> APPARATUS FOR REDUCING MOISTURE OF FRONT OPENING UNIFIED POD IN LOAD PORT MODULE AND SEMICONDUCTOR PROCESS DEVICE COMPRISING THE SAME

APPARATUS FOR REDUCING MOISTURE OF FRONT OPENING UNIFIED POD IN LOAD PORT MODULE AND SEMICONDUCTOR PROCESS DEVICE COMPRISING THE SAME

机译:用于减少负载端口模块中的前开口统一吊舱的水分的装置和包括该的半导体工艺装置

摘要

The present invention relates to a device for reducing humidity of a wafer container of a load port module and a semiconductor processing device having the same, which is installed on the front of the wafer container in the load port module to form an air film at the entrance to the wafer container to reduce the humidity of the wafer container. It includes a main body installed on the upper front side of the wafer container, a blowing unit that blows air to supply air to the inside of the main unit, and a dispersing unit that disperses the air supplied to the inside of the main unit downward to form an air film. Characterized in that. Therefore, the present invention forms an air film at the entrance of the wafer container by installing the body part, the blower part, and the dispersion part on the front of the wafer container in the load port module, thereby forming a blocking air film at the entrance to reduce the humidity of the wafer container to inflow outside air. It provides an effect that can block.
机译:本发明涉及一种用于减少负载端口模块的晶片容器的湿度的装置和具有相同的半导体处理装置,该装置安装在负载端口模块中的晶片容器的前面,以形成空气膜进入晶圆容器以减少晶圆容器的湿度。它包括安装在晶片容器的上部前侧的主体,吹风单元吹向空气以向主单元的内部供应空气,以及分散单元,分散单元将供应到主单元的内部的空气分散在向下形成空气膜。其特征在于。因此,本发明通过在负载端口模块中安装主体部分,鼓风机部分,在晶片容器的前部上,在晶片容器的前部上安装在晶片容器的入口处的空气膜,从而形成阻挡空气膜减少晶圆容器湿度的入口,以进入外部空气。它提供了可以阻止的效果。

著录项

  • 公开/公告号KR20210023653A

    专利类型

  • 公开/公告日2021-03-04

    原文格式PDF

  • 申请/专利权人 주식회사 저스템;

    申请/专利号KR1020200017088

  • 发明设计人 장상래;한대연;성용현;

    申请日2020-02-12

  • 分类号H01L21/673;H01L21/677;

  • 国家 KR

  • 入库时间 2022-08-24 17:31:53

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号