Pattern data, pattern data production method and photomask

摘要

PROBLEM TO BE SOLVED: To provide pattern data capable of reducing a load in a manufacturing process using a drawing apparatus. In the present disclosure, pattern data used in a drawing device and used to form a three-dimensional shape in a resist, and the pattern data corresponds to a unit region of the three-dimensional shape. As the region, there is a unit pattern region composed of a rectangular pattern set, and in the unit pattern region, a plurality of stripe regions long in the X-axis direction are arranged along the Y-axis direction orthogonal to the X-axis direction. In the stripe region, the rectangular pattern set is continuously formed along the X-axis direction, and in the stripe region, the position in the rectangular pattern set is P, and the Y-axis of the rectangular pattern set in P is defined as P. The problem is solved by providing pattern data in which the LP corresponds to the height of the three-dimensional shape in the P when the length in the direction is LP. [Selection diagram] Fig. 1