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INFRARED BANDPASS FILTER STRUCTURE AND INFRARED BANDPASS FILTER USING THE STRUCTURE

机译:红外线带通滤波器结构和红外带通滤波器使用该结构

摘要

An infrared bandpass filter structure is formed by alternately stacking a plurality of silicon aluminum hydride layers and a plurality of low-refractive-index layers. The plurality of low-refractive-index layers include oxide. The infrared bandpass filter structure has a pass band that at least partly overlaps the wavelength range of 800 nm-1600 nm. The pass band have a center wavelength, and the center wavelength has a magnitude of shift that is less than 11 nm when an incident angle changes from 0° to 30. An infrared bandpass filter includes the infrared bandpass filter structure formed on a first side surface of a substrate and an antireflection layer formed on a second side surface of the substrate that is at a side opposite to the first side surface.
机译:通过交替地堆叠多个硅氢层和多个低折射率层来形成红外带通滤波器结构。多个低折射率层包括氧化物。红外带通滤波器结构具有通频带,其至少部分地与800nm-1600nm的波长范围重叠。通带具有中心波长,并且当入射角从0°变为30时,中心波长的换档幅度小于11nm。红外带通滤波器包括在第一侧表面上形成的红外带通滤波器结构基板和形成在基板的第二侧表面上的抗反射层,其位于与第一侧表面相对的一侧。

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