Method of chemically etching glass surfaces

• 1. 一种自动精密电化学蚀刻方法及自动精密电化学蚀刻设备 [P] . 中国专利： CN111074329A . 2020-04-28
• 2. 使用具电化学蚀刻停止的电化学蚀刻制造瓶沟电容器方法 [P] . 中国专利： CN100336204C . 2007.09.05
• 3. METHOD FOR SELECTIVE PALSMOCHEMICAL DRY-ETCHING OF PHOSPHOSILICATE GLASS DEPOSITED ON SURFACES OF SILICON WAFERS [P] . 美国专利： US2010062608A1 . 2010-03-11

  机译： 硅晶片表面选择性磷化玻璃干法化学刻蚀的方法

• 4. METHOD FOR SELECTIVE PLASMOCHEMICAL DRY-ETCHING OF PHOSPHOSILICATE GLASS DEPOSITED ON SURFACES OF SILICON WAFERS [P] . 欧洲知识产权局专利： EP2057670A2 . 2009-05-13

  机译： 硅晶片表面选择性沉积磷化玻璃的等离子化学刻蚀方法

• 5. A method for selectively plasma-chemical dry etching of to the surfaces of silicon - wafers trained phosphorous silicate glass [P] . 德国专利： DE102006042329B4 . 2008-08-21

  机译： 一种选择性等离子体化学干法刻蚀硅晶片表面磷硅酸玻璃的方法。

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• 1. The Effect of Silver-Plating Time on Silicon Nanowires Arrays Fabricated by Wet Chemical Etching Method [J] . Shanshan Wang ,Jun Han ,Shujing Yin . 光学与光子学期刊（英文） . 2019,第8期
• 2. 化学蚀刻CR39 SSNTD利用<'10>B(n，α)<'7>Li反应测量4л各向同性中子能谱（En＝0．025eV～0．1MeV）的方法 [C] . 邹士亚 ,南亲良 ,李伯阳 . 第六届全国固体核径迹探测器会议 . 1998
• 3. 非线性混频声学方法对玻璃表面微裂纹定量评估的理论研究 [A] . 唐俊杰 . 2017