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Light sensitive coatings for screen printing comprising a light sensitive material with a condensate of a omega, omega'-diamine and a omega, omega'-dicarboxylic acid

机译:用于丝网印刷的光敏涂料,其包含光敏材料以及ω,ω-二胺和ω,ω-二羧酸的缩合物

摘要

942,824. Light-sensitized materials for stencil production. KALLE A. G. Sept. 27,1960 [Oct. 2, 1959], No. 33169/60. Headings G2C and G2M. A porous support is provided with a coating including an N-alkoxy-methylated partially depolymerized polycondensate of an #,#SP1/SP-diamine with an #,#SP1/SP-dicarboxylic acid which is soluble in aqueous alcohol or in aliphatic alcohols, and is sensitized as with a bichromate, diazonium compound or an azido-styryl compound. Procedure therewith is exposure as under a diapositive and treatment with aqueous alcohol to leave a stencil. In Example 1 4, 4SP1/SP-diazidostilbene-2, 2SP1/SP-disulphonic acid sodium salt in aqueous ethylene glycol monomethyl ether is added to a commercial polyadipic acid hexamethylene diamine type polyamide, which had been partially depolymerized by strong acid and subsequently methylated with paraformaldehyde, in aqueous alcohol and the mixture is coated by immersion and draining or spraying on to a support as of Japanese-fibre paper, polyamide, polyester, silk, glass or metal fabric, exposed and developed with aqueous methyl, ethyl or propyl alcohol to make a stencil suitable for very prolonged use. Example 2 uses, similarly, ammonium bichromate as sensitizer; Example 3 a polysebacic acid type polyamide in the manner of Example 1; Example 4 the tetrazoborofluoride from 4, 4SP1/SP- diaminostilbene as sensitizer with the polyamide material of Example 1 and describes prolonged exposure to produce cross-linking and provide a stencil resistant to hydrofluoric acid for the etching of glass, and Example 5 eleven further azido compounds for replacement of the sensitizers of Examples 1-3.
机译:942,824。用于模板生产的光敏材料。 KALLE A. G.,1960年9月27日[Oct. [1959年2月],第33169/60号。标题G2C和G2M。多孔载体具有涂层,该涂层包含#,# 1 -二胺与#,# 1 -二羧酸的N-烷氧基甲基化的部分解聚缩聚物,溶于水溶性醇或脂族醇,并用重铬酸盐,重氮化合物或叠氮基苯乙烯基化合物敏化。与之一样的方法是在叠氮化物中进行曝光,并用含水酒精处理以留下模版。在实施例1-4中,将在乙二醇单甲醚水溶液中的4 1 -二叠氮基二苯乙烯-2、2 1 -二磺酸钠盐添加到市售的聚己二酸六亚甲基二胺型聚酰胺中。将其先在强酸中进行部分解聚,然后在水性醇中用多聚甲醛甲基化,然后将其浸泡,沥干或喷涂在日式纤维纸,聚酰胺,聚酯,丝绸,玻璃或金属织物上,将其暴露于甲基,乙基或丙醇水溶液中并显影,以制成适合非常长时间使用的模板。实施例2类似地使用重铬酸铵作为敏化剂。实施例3:按实施例1的方式制备的聚癸二酸型聚酰胺。实施例4,与实施例1的聚酰胺材料一起使用4,4 1 -二氨基amino的四唑硼氟化物作为敏化剂,并描述了长时间暴露以产生交联并提供耐氢氟酸的模版以蚀刻玻璃。实施例5:另外11种叠氮基化合物,用于代替实施例1-3的敏化剂。

著录项

  • 公开/公告号US3143416A

    专利类型

  • 公开/公告日1964-08-04

    原文格式PDF

  • 申请/专利权人 AZOPLATE CORPORATION;

    申请/专利号US19600057414

  • 申请日1960-09-21

  • 分类号C08L77;G03F7/038;G03F7/12;

  • 国家 US

  • 入库时间 2022-08-23 16:10:28

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