Macrocyclic derivatives of the silicon or germanium, the process for their preparation and their applications.

• 1. 一种乙烯基硅锗锡烷衍生物的制备方法 [P] . 中国专利： CN109021003B . 2021.06.01
• 2. 一种乙烯基硅锗锡烷衍生物的制备方法 [P] . 中国专利： CN109021003A . 2018-12-18
• 3. A process for the preparation of an epitaxial silicon - germanium layer and integrated semiconductor device with an epitaxial with arsenic in - situ doped silicon - germanium layer [P] . 德国专利： DE10341806A1 . 2005-05-25

  机译： 制备外延锗硅锗外延硅层和集成半导体器件的方法。

• 4. METHOD FOR FORMING SILICON-GERMANIUM STRESSOR WITH THE HIGH GERMANIUM CONCENTRATION, CAPABLE OF FORMING THE SILICON-GERMANIUM STRESSOR FROM A SECOND SILICON-GERMANIUM LAYER BY IMPLEMENTING A HEAT DIFFUSION PROCESS [P] . 韩国专利： KR20110011573A . 2011-02-08

  机译： 高锗浓度形成硅锗应力的方法，该方法能够通过实施热扩散过程而由第二硅锗层形成硅锗应力

• 5. PROCESS FOR THE PREPARATION OF A SILICON DIOXIDE LAYER BY HIGH TEMPERATURE OXIDATION ON A SUBSTRATE HAVING AT LEAST ON THE SURFACE OF GERMANIUM OR A SICICIUM-GERMANIUM ALLOY [P] . 法国专利： FR2868202B1 . 2006-05-26

  机译： 在锗或硅锗合金表面上至少存在的基质上通过高温氧化制备二氧化硅层的方法

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• 1. Preparation and Optimization of High-Purity Silicon Carbide Magnetic Abrasives for the Magnetic Induction-Wire Sawing Process [J] . Wei Zhang ,Tengwei Qiu ,Chunyan Yao . 流体力学与材料加工(英文) . 2020,第4期
• 2. PREPARATION AND SECOND-ORDER OPTICAL NONLINEARITY OF NOVEL PHENOXYSILICON NETWORKS BY SOL-GEL PROCESS [J] . Xiao Huang Jian Wang Ling-zhi Zhang Zhi-gang Cai Zhao-xi Lianga . 高分子科学：英文版 . 2001,第1期
• 3. TEM and STEM Observations of a Flat Continuous Silicon-Germanium Thin Film Epitaxially Grown on Porous Silicon [J] . Junji Yamanaka ,Noritaka Usami ,Sevak Amtablian . 材料科学与化学工程（英文） . 2017,第1期
• 4. Quantitative Evaluation of an Epitaxial Silicon-Germanium Layer on Silicon [J] . Jie-Yi Yao ,Kun-Lin Lin ,Chiung-Chih Hsu . 显微镜研究（英文） . 2015,第4期
• 5. 一维硅锗纳米复合材料的制备及在场效应晶体管中的应用 [C] . 裴立宅 ,赵海生 ,谭伟 . 第六届中国功能材料及其应用学术会议 . 2007
• 6. 新型硅、锗及硅锗异质结纳米线应变效应的第一性原理研究及应用设计 [A] . 韩瑞峰 . 2015