首页> 外国专利> method and device for the precipitation of layers, which differ in composition differences, on a substrate, voortbrengsels,bevattendedergelijke successive layers and electronic devices, in particular halfgeleiderinrichtingen comprising such voortbrengsels

method and device for the precipitation of layers, which differ in composition differences, on a substrate, voortbrengsels,bevattendedergelijke successive layers and electronic devices, in particular halfgeleiderinrichtingen comprising such voortbrengsels

机译:于在衬底,voortbrengsels,bevattendedergelijke连续层上沉积成分不同的层的方法和设备以及电子设备,特别是包含这种voortbrengsels的半凝胶浸润剂

摘要

1387023 Gallium arsenide PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd 12 April 1972 [15 April 1971] 16839/72 Heading C1A [Also in Division C7] Different layers are deposited on a substrate 6 to form, e.g. a semi-conductor device by deposition from a gaseous phase in a reaction vessel 1. The substrate is moved manually or mechanically to a container 10 where, e.g. gallium arsenide, using AsCl 3 which is passed over a mass 11 of Ga is deposited, and to orifices 13, 15 where layers of doping materials, e.g. S or Zn in a carrier gas, e.g. hydrogen, are deposited. The reaction vessel is placed in a furnace arranged to provide different temperatures in different parts of the vessel.
机译:1387023砷化镓飞利浦电子及相关工业有限公司1972年4月12日[1971年4月15日] 16839/72标题C1A [也在C7分部中]不同的层沉积在基板6上以形成,例如,厚度为1微米。通过从反应容器1中的气相沉积形成半导体器件。将衬底手动或机械地移动到容器10中,例如,在容器10中,容器10从容器10中移出。使用砷化镓(砷化镓),将砷化镓(GaCl 3)沉积,该砷化镓通过Ga的质量11上方,并沉积到孔口13、15,在孔口13、15处掺入一层掺杂材料,例如铝。载气中的S或Zn氢沉积。将反应容器放置在布置成在容器的不同部分中提供不同温度的炉中。

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