首页> 外国专利> METHOD OF MAKING A HIGH FREQUENCY LIGHT EMITTING GaAs {11 {118 {11 P {11 {0 (0{21 X{21 0.6) DIODE

METHOD OF MAKING A HIGH FREQUENCY LIGHT EMITTING GaAs {11 {118 {11 P {11 {0 (0{21 X{21 0.6) DIODE

机译:制作高频发光GaAs {11 {118 {11 P {11 {0(0 {21 X {21 0.6)

摘要

A method of making a high efficiency light emitting GaAs1-xPx (0x0.6) diode, wherein Zn is diffused as acceptor into an n-type crystal by using a diffusion source, whose composition lies, in a Ga-P-Zn phase diagram, in a triangular region, the three apices of which are Zn3P2, GaP and the point where the content in P is lowest in the region having a higher content in P among two liquid phase regions; a window through which light generated at a p-n junction formed therein can emerge from the crystal with high external quantum efficiency is thereby formed by an enrichment in P at the same time as the surface layer of an n-type GaAs1-xPx (0x0.6) crystal is converted into a p-type layer.
机译:一种制造高效发光GaAs1-xPx(0

著录项

  • 公开/公告号US3753808A

    专利类型

  • 公开/公告日1973-08-21

    原文格式PDF

  • 申请/专利权人 HITACHI LTDJA;

    申请/专利号USD3753808

  • 申请日1971-02-12

  • 分类号H01L7/44;

  • 国家 US

  • 入库时间 2022-08-23 06:25:19

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