Homogeneous manganese telluro bismuthide film prodn - by two stage vapour deposn. and tempering

摘要

A MnBi1-xTex film (where pref. x = 0.075-0.2) is produced by: simultaneous deposn. of Bi and Te on a heated substrate from 2 vapour sources; deposn. of Mn from the vapour phase in a separate stage; application of a protective film; and tempering. The film consists of a single phase, and the phase inversion at ca. 360 degrees C is suppressed completely, so that the Curie temp. point (420 degrees C) of the low temp. phase can be attained. The Curie temp. of the film is pref. 400-430 degrees C. The substrate is glass at ca. 90 degrees C and tempering is carried out for 1/4 hr at 250-350 degrees C.