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Electrolyte and method for electrodepositing rhodium-ruthenium alloys

机译:电解质和电沉积铑-钌合金的方法

摘要

Disclosed is an electroplating bath suitable for depositing a rhodium-ruthenium alloy containing at least 90 weight % rhodium. Rhodium and ruthenium are present in the plating bath in the form of soluble platable compounds in a weight ratio of from 10:1 to 200:1. The deposits obtained by this bath exhibit improved brightness over comparable baths even without the addition of lead, and also exhibit reduced stress as compared to deposits obtained from rhodium-platinum baths.
机译:公开了一种适于沉积包含至少90重量%的铑的铑-钌合金的电镀浴。铑和钌以可溶的可镀化合物的形式存在于镀浴中,重量比为10:1至200:1。与从铑-铂浴获得的沉积物相比,通过该浴获得的沉积物即使不添加铅也比同类浴显示出更高的亮度,并且应力降低。

著录项

  • 公开/公告号US3892638A

    专利类型

  • 公开/公告日1975-07-01

    原文格式PDF

  • 申请/专利权人 OXY METAL INDUSTRIES CORPORATION;

    申请/专利号US19740492578

  • 发明设计人 STEVENS;PETER;DEUBER;JOHN M.;

    申请日1974-07-29

  • 分类号C23B5/32;

  • 国家 US

  • 入库时间 2022-08-23 03:29:00

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