首页> 外国专利> APPARATUS AND METHOD FOR ELIMINATING INTERFERENCE ERRORS IN DUAL-BEAM INFRARED REFLECTION MEASUREMENTS ON A DIFFUSELY REFLECTING SURFACE BY GEOMETRICAL ELIMINATION OF INTERFERENCE-PRODUCING SPECULARLY-REFLECTED RADIATION COMPONENTS

APPARATUS AND METHOD FOR ELIMINATING INTERFERENCE ERRORS IN DUAL-BEAM INFRARED REFLECTION MEASUREMENTS ON A DIFFUSELY REFLECTING SURFACE BY GEOMETRICAL ELIMINATION OF INTERFERENCE-PRODUCING SPECULARLY-REFLECTED RADIATION COMPONENTS

机译:通过几何学消除产生干扰的特定反射的辐射分量来消除漫反射表面上的双光束红外反射测量中的干扰误差的装置和方法

摘要

Interference error elimination is provided for infrared reflection measurement of a film having a diffusely reflecting surface by apparatus and method which utilizes geometrical arrangement of apparatus components for geometrical selection of only diffusely reflected radiation components and elimination of specularly reflected radiation components that would produce interference error. A specific application of this measurement technique is in connection with a two-layer, sheet-form product having a film of infrared-radiation-transmissive material formed on a substrate or base layer with the interface surface being diffuse. A radiation source forms and directs two beams of infrared radiation of discrete wavelengths in angularly incident relationship toward an exposed, specular surface of the film producing reflective-components at both the specular surface and the diffuse interface surface. Only diffusely reflected components of incident beams of radiation are detected by a radiation-responsive sensor which is disposed in a particular geometrical arrangement such that only the diffusely reflected beam components are incident to a radiation receptor surface of the sensor. Thus, interference errors are eliminated as the specularly reflected beam components will not be incident to the radiation sensors receptor-surface.
机译:通过装置和方法提供了用于消除具有漫反射表面的膜的红外反射测量的干涉误差,该装置和方法利用装置组件的几何布置来仅对漫反射辐射分量进行几何选择,并消除了会产生干涉误差的镜面反射辐射分量。该测量技术的特定应用与两层片状产品有关,该产品具有形成在基底或基层上且界面扩散的红外透射材料膜。辐射源形成并以角度入射关系将离散波长的两个红外辐射束引导到膜的暴露的镜面,从而在镜面和扩散界面处产生反射分量。辐射响应传感器仅检测到辐射的入射光束的散射反射分量,该辐射响应传感器以特定的几何布置方式布置,使得只有散射反射的光束分量入射到传感器的辐射接收器表面。因此,由于镜面反射的光束分量不会入射到辐射传感器接收器表面,因此消除了干扰错误。

著录项

  • 公开/公告号JPS511135B1

    专利类型

  • 公开/公告日1976-01-14

    原文格式PDF

  • 申请/专利权人

    申请/专利号JP19700097274

  • 发明设计人

    申请日1970-11-06

  • 分类号G01B11/06;G01N21/34;

  • 国家 JP

  • 入库时间 2022-08-23 03:20:01

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