首页> 外国专利> new dibicyclo (3,3,1) and (2,2,1) heptyl and dibicycle (3,3,1) and (2,2,1) hepyrnyl polyamides and their methods of preparation

new dibicyclo (3,3,1) and (2,2,1) heptyl and dibicycle (3,3,1) and (2,2,1) hepyrnyl polyamides and their methods of preparation

机译:新的双双环(3,3,1)和(2,2,1)庚基和双环(3,3,1)和(2,2,1)庚基聚酰胺及其制备方法

摘要

Compounds of the formula I IMAGE and their acid addition salts in which A represents identical or different groups of the formula IMAGE or a [3.1.1]bicyclic group of the formula IMAGE and the other substituents have the meaning given in Claim 1 are prepared by reduction of the corresponding Schiff's base. The compounds have a broad antimicrobial spectrum and are particularly active against Gram-negative and anaerobic bacteria.
机译:式I 的化合物及其酸加成盐,其中A代表式的相同或不同基团或式的[3.1.1]双环基团,且其他取代基具有给定的含义权利要求1中的权利要求是通过减少相应的席夫氏碱制备的。该化合物具有广泛的抗菌谱,对革兰氏阴性和厌氧细菌特别有效。

著录项

  • 公开/公告号BE837478A

    专利类型

  • 公开/公告日1976-07-12

    原文格式PDF

  • 申请/专利权人

    申请/专利号BE19760163440

  • 发明设计人

    申请日1976-01-12

  • 分类号C07C;

  • 国家 BE

  • 入库时间 2022-08-23 02:59:44

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