PROCESS FOR THE MANUFACTURE OF N-SUBSTITUTED INDOLES AND NEW N-SUBSTITUTED INDOLES

摘要

1377901 Indole derivatives CIBA-GEIGY AG 22 Nov 1972 [26 Nov 1971 23 Oct 1972] 53979/72 Heading C2C The invention comprises indoles of the Formula (I) in which R 1 is a C 6 alkyl radical or a C 3 -C 18 alkenyl radical, R 2 is hydrogen or a C 1 -C 4 alkyl radical and R 3 is a C 1 -C 4 alkyl radical, an aryl radical or hydrogen, indoles of Formula (II) in which R 2 is a C 2 -C 18 alkyl, a C 3 -C 18 alkenyl radical, or an alkyl or alkenyl radical substituted by halogen, hydroxy, C 1 -C 4 alkoxy or alkylamino group, R 2 is hydrogen or a C 1 -C 4 alkyl radical, R 3 is a C 1 -C 4 alkyl radical and R 4 is C 1 -C 4 alkoxy radical; and also a method of making these and other N-substituted indoles by treating an indole with a base in dimethyl sulphoxide or in a dipolar aprotic solvent with a tertiary acid amide group, e.g. dimethyl formamide or dimethyl acetamide and subsequently reacting it either with a compound of formula R-X in which X is a leaving group and R represents an optionally substituted alkyl or alkenyl radical or with an alkene which carries an electrophilic substituent at the double bond, or with an epoxide. Preferred leaving groups are halogen, sulphate or sulphonate groups and preferably R is an aralkyl, alkyl or alkenyl radical optionally substituted bycarboxylic acid, carboxylic acid ester, alkoxy or alkylamino group. Preferred electrophilio groups are cyano and carbalkoxy groups.