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A method for epitaxial producing of fe deep 3 0 deep 4 and wye fe deep 2 0 deep 3 existing thin films on the particular materials

机译:外延生产Fe深3 0深4和Y型Fe深2 0深3现有薄膜的方法

摘要

A first thin film of appropriate texture, lattice constant, and crystal structure, such as body centered cubic vanadium or chromium with (110) texture is deposited upon a rigid or flexible substrate forming a plurality of polycrystals. A ferrite such as magnetite (Fe.sub. 3 O.sub.4) is sputtered from a target onto the first thin film forming a mixture of . gamma.Fe.sub.2 O.sub.3 and Fe.sub.3 O.sub.4 substantially completely without formation of Fe or other oxides of iron, providing good magnetic characteristics and resistance to corrosion. The substrate temperature can be maintained as low as 200°C for both steps when sputtering or evaporation is employed.
机译:将具有适当纹理,晶格常数和晶体结构的第一薄膜,例如具有(110)纹理的体心立方钒或铬沉积在刚性或柔性基板上,形成多个多晶。将诸如磁铁矿(Fe 3 O 4)之类的铁氧体从靶材溅射到第一薄膜上,形成的混合物。 γFe2 O 3和Fe 3 O 4基本上完全没有形成铁或其他铁氧化物,从而提供了良好的磁性和耐腐蚀性。当采用溅射或蒸发时,两个步骤的衬底温度都可以保持在200℃以下。

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