首页> 外国专利> Photo elasticity technique for separating principal stresses - model under load conditions using automatic polarimeter and interferometer

Photo elasticity technique for separating principal stresses - model under load conditions using automatic polarimeter and interferometer

机译:分离主应力的光弹性技术-使用自动旋光仪和干涉仪在载荷条件下进行建模

摘要

A photoelasticity technique for separating principal stresses is employed in a model underload conditions using automatic polarimeter and interferometer, providing the sum and the difference of the stresses at a given point of the model under load conditions. The instrument has in optical alignment, a monochromatic light source, (1) polarisation system (3), focussing system, a model to be studied (4), and an automatic polarimeter (5). Between the polarisation system and the model there is a thin semi-reflecting sheet (10) which transmits the light returned following reflection at each of the faces of the model on to a screen (11). The variation in the order of interference on the screen is related to the variation in the sum of the principal stresses at the point studied due to a variation in loading.
机译:使用自动偏振仪和干涉仪,在模型欠载条件下采用分离主应力的光弹性技术,提供了在负载条件下模型给定点的应力之和和差。该仪器具有光学对准,单色光源,(1)偏振系统(3),聚焦系统,要研究的模型(4)和自动偏振仪(5)。在偏振系统和模型之间,有一个薄的半反射片(10),它将反射后在模型的每个面上反射回来的光透射到屏幕(11)上。屏幕上干涉顺序的变化与所研究点的主应力之和的变化有关,这是由于载荷的变化引起的。

著录项

  • 公开/公告号FR2274907A1

    专利类型

  • 公开/公告日1976-01-09

    原文格式PDF

  • 申请/专利权人 ETAT FRANCAIS;

    申请/专利号FR19740039759

  • 申请日1974-12-05

  • 分类号G01L1/24;G01B11/16;G01N3/00;G01N21/46;

  • 国家 FR

  • 入库时间 2022-08-23 01:51:34

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