Method of diffusing silicon slices with dopant at high temperatures

摘要

A method of applying a boron dopant to silicon slices which comprises applying a dopant solution to the faces of each slice, packing a plurality of slices adjoining each other in a quartz boat and inserting the boat slowly into a tubular furnace. The boron surface of each slice is covered with alumina powder to eliminate sticking. After heating at 1350° Celsius for four hours the slices are slowly pulled out of furnace.