A method for the alignment of the electron gun system of a more beam cathodes beam roehre terms of the phosphor elements on the screen

• 1. 具有用于电子束操作的局部抽空容积的集成电路分析系统和方法 [P] . 中国专利： CN108226737B . 2022.01.11
• 2. 具有用于电子束操作的局部抽空容积的集成电路分析系统和方法 [P] . 中国专利： CN108226737A . 2018-06-29
• 3. Cathodes beam roehre with between the deflection system and the phosphor screen means arranged to the increase of the angle of deflection of the electron beam [P] . 德国专利： DE1222170B . 1966-08-04

  机译： 在偏转系统和荧光屏装置之间具有阴极束流，以增加电子束的偏转角

• 4. Apparatus and method for automatic alignment of an electron gun with a plurality of beams in relation to the piston of a cathode ray roehre [P] . 德国专利： DE2935855A1 . 1980-03-06

  机译： 用于使电子枪相对于阴极射线罗伊尔的活塞自动对准的装置和方法

• 5. Beam index cathode ray tube includes display screen having linear phosphor stripes on its inner surface, electromagnetic deflector, and electron gun comprising cathode, beam forming region, and focusing lens [P] . NL1020486C2 . 2003-10-28

  机译： 束指数阴极射线管包括在其内表面上具有线性荧光粉条的显示屏，电磁偏转器以及包括阴极，束形成区域和聚焦透镜的电子枪。

• 1. Methods of measurement for the beam-based alignment system in HLS [J] . CAO Yong, SUN Bao-Gen, LU Ping 核技术（英文版） . 2005,第006期
• 2. Beam and image experiment of beam deflection electron gun for distributed X-ray sources [J] . Cheng-Jun Tan, Cong Xu, Chuan-Xiang Tang, 核技术（英文版） . 2019,第003期
• 3. Study of Emission Character of High Current Densities Thermionic Cathodes for Electron Beam Processing System [J] . Cao Shuchun, Li Zhongping, Zhang Ziming, 近代物理研究所和兰州重离子加速器实验室年报：英文版 . 2008,第001期
• 4. Analysis of regular and chaotic dynamics of the Euler-Bernoulli beams using finite difference and finite element methods [J] . J.Awrejcewicz, A.V.Krysko, J.Mrozowski, 力学学报：英文版 . 2011,第001期
• 5. Analysis of regular and chaotic dynamics of the Euler-Bernoulli beams using finite difference and finite element methods [J] . J. Awrejcewicz, A.V. Krysko, J. Mrozowski, 力学学报：英文版 . 2011,第001期
• 6. Alignment Method of Low-energy Electron-Beam Direct Writing System EBIS Using Voltage Contrast Image [C] . Takeshi Koshiba, Takumi Ota, Tetsuro Nakasugi, Emerging Lithographic Technologies XI pt.1; Proceedings of SPIE-The International Society for Optical Engineering; vol.6517 pt.1 . 2006
• 7. High-brightness electron beams from a DC, high-voltage, GaAs photoemission gun. [D] . Engwall, David Alan. 1998
• 8. Sapphire Wafer for 226 nm Far UVC Generation withCarbon Nanotube-Based Cold Cathode Electron Beam (C-Beam) Irradiation [O] . Sung Tae Yoo, Kyu Chang Park 2020
• 9. Development of High Power Electron Beam Gun (Report I) : Generation of High Power Electron Beam with LaB_6 Cathode(Physics, Process, Instruments Measurements) [O] . Tomie M., Abe N., Kato Y., 2015

• 1. 用于控制强流脉冲电子束均匀性和能通量密度的磁场系统设计 [C] . 刘国治 . 中国加速器学会高功率粒子束专业组第三届学术交流会 . 1988
• 2. 熔炼电子枪系统参数对电子束性能影响的研究 [A] . 刘光辉 . 2016