首页> 外国专利> Crucibleless zone melting, for large semiconductor stock - using induction coil with additional radiation source at jagged fringe

Crucibleless zone melting, for large semiconductor stock - using induction coil with additional radiation source at jagged fringe

机译:适用于大型半导体库存的无坩埚区熔化-在锯齿状边缘使用带有附加辐射源的感应线圈

摘要

A crucibleless zone melting process for a vertical semi-conductor crystal rod (a single silicon crystal) uses an annular inductive heating coil of smaller inside dia. than the outside dia. of the stock. Additional radiation energy (a focussed high-energy light beam, a laser beam or a high-energy electrom beam) is directed to the stock in the area of the melting zone fringe. Stock with a large dia., which is preferred for economy reasons, can now be utilised for the pulling of single crystals of large dia.
机译:垂直半导体晶体棒(单晶硅)的无坩埚区熔化工艺使用内径较小的环形感应加热线圈。比外面的直径大股票。额外的辐射能量(聚焦的高能光束,激光束或高能电子束)被引导到熔化区边缘区域中的原料。由于经济原因,首选大直径的库存,现在可以将其用于提拔大直径的单晶。

著录项

  • 公开/公告号DE2630366A1

    专利类型

  • 公开/公告日1978-01-12

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DE19762630366

  • 发明设计人 KELLERWOLFGANGDR.RER.NAT.;

    申请日1976-07-06

  • 分类号B01J17/10;

  • 国家 DE

  • 入库时间 2022-08-22 22:01:46

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