Photothermoplastic electrophotographic copying material - based on copolymer of vinyl!-carbazole and alkyl methacrylate! with low mol. wt.

摘要

Photothermoplastic material consists of a substrate with an optically sensitised layer of a copolymer of 30-70 mole % N-vinylcarbazole and methacrylate(s) of 10-18C linear or branched alcohols, the copolymer havng a mol. wt. of 500-2980 and pref. a Tg of -50 to +80, esp. -30 to +50 degrees C. The material is used for electrophotographic copying. The use of copolymers with a mol. wt. in the given range improves the photosensitivity. The copolymer layer is pref. 0.1-1.5 mu m thick and is sensitised with an electron acceptor or dyestuff. In an example, a copolymer of 43.5 mole % n-dodecyl methacrylate and 56.5 mole % N-vinylcarbazole with a mol.wt. of 1399 was used, with crystal violet as sensitiser.