首页> 外国专利> Sensor for an analysis apparatus for electron beam.

Sensor for an analysis apparatus for electron beam.

机译:用于电子束分析设备的传感器。

摘要

A directionally sensitive, high contrast secondary electron detector having a novel geometrical configuration for use in scanning electron microscopes and other electron beam instruments. The aperture of the detector which is placed near the specimen is in non-parallel arrangement with the aperture which admits the primary beam. The geometry of the detector provides for tilting of the specimen with respect to the incident primary electron beam to improve sensitivity and signal-to-noise ratio in comparison with prior detectors. In the preferred embodiment, the shape of the upper grid of the detector is substantially that of a conic section, thereby preventing space-charge build-up during operation.
机译:一种方向敏感的,高对比度的二次电子探测器,具有新颖的几何结构,可用于扫描电子显微镜和其他电子束仪器。放置在样本附近的检测器的孔径与入射主光束的孔径不平行。与现有的检测器相比,检测器的几何形状使样品相对于入射的初级电子束倾斜,从而提高了灵敏度和信噪比。在优选实施例中,检测器的上部栅格的形状基本上是圆锥形部分的形状,从而防止在操作期间积累空间电荷。

著录项

  • 公开/公告号FR2303285B1

    专利类型

  • 公开/公告日1978-05-19

    原文格式PDF

  • 申请/专利权人 IBM;

    申请/专利号FR19760001480

  • 发明设计人

    申请日1976-01-14

  • 分类号G01N23/22;

  • 国家 FR

  • 入库时间 2022-08-22 21:48:26

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号