首页> 外国专利> Determn. of emittance of beam of charged particles - permitting beam of predetermined dimensions to be obtd. at zone of utilisation

Determn. of emittance of beam of charged particles - permitting beam of predetermined dimensions to be obtd. at zone of utilisation

机译:确定。带电粒子束的发射率-允许预定尺寸的束被遮挡。在利用区

摘要

Determn. comprises measuring the max. elongation of the beam at two points in its trajectory, one downstream of the other, and the max. elongation at the downstream point when the beam is subjected to the action of a quadripolar lens of convergence C placed near the upstream point, the distance between the lens and the downstream point being equal to 1/C. The appts. consists of a first measuring system, giving the max. elongation at a point P1 in a plane Q perpendilar to the trajectory along a specified axis X1X1. A second measuring system gives the max. elongation at a point P2 downstream of P1 in a plane parallel to plane Q and along an axis X2X2, parallel to X1X1. A magnetic lens is present of the quadripolar type. Any system of guiding the beam can be regulated, in an optimum way, to obtain in the area of utilisation, e.g. a target, a beam of predetermined dimensions.
机译:确定。包括测量最大值光束在其轨迹的两个点处的伸长率,一个在另一个点的下游,最大当光束受到位于上游点附近的会聚四极透镜C作用时,在下游点的伸长率,该透镜与下游点之间的距离等于1 / C。苹果。包括第一个测量系统,给出最大在垂直于轨迹的平面Q上的点P1沿指定轴X1X1的伸长率。第二个测量系统给出最大值。在平行于平面Q并沿平行于X1X1的轴X2X2的平面中,在P1下游的点P2处的伸长率。存在四极型的磁性透镜。可以以最佳方式调节引导光束的任何系统,以在使用范围内获得例如目标,预定尺寸的光束。

著录项

  • 公开/公告号FR2357913A1

    专利类型

  • 公开/公告日1978-02-03

    原文格式PDF

  • 申请/专利权人 CGR MEV;

    申请/专利号FR19760020767

  • 申请日1976-07-07

  • 分类号G01T1/29;

  • 国家 FR

  • 入库时间 2022-08-22 21:45:58

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