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PRODUCTION OF PLAIN BOILED CAN OF SHELLFISHES WITH SHELL

机译:用壳生产带壳平底罐头

摘要

PURPOSE:To establish desired spectral sensitivity characteristics by simultaneously controlling the junction depth of p-n, width of depletion layer and the length of substrate side minority carrier diffusion, through the suitable selection of the substtate concentration, in a p-n junction type photo diode. CONSTITUTION:Various gas phase epitaxial growing GaAs0.62P0.38 substrates having the electron concentration of 6X1015cm-3 to 3X1018cm-3 are prepared, and after sequentially depositing Al2O3 of 1000Angstrom and siO2 of 2000Angstrom on the substrates with CVD method, the ion injection window is formed and Zn ions of 50 KeV are injected with 1X1014 cm-3. After that, by performing anneal of 650 deg.C, 30 minutes under phosphorus atomosphere the photo diode of 1.05mm2 of photo detecting area can be obtained. The junction capacitance at zero bias, the width of depletion layer calculated by this and the depth of p-n junction for the diode thus obtained can be shown as Table 1.
机译:目的:通过同时控制的p-n,耗尽层的宽度和基板侧的少数载流子扩散长度的结深度,通过substtate浓度的合适的选择,在一个p-n结型光电二极管建立期望的光谱灵敏度特性。组成:制备电子浓度为6X10 15 cm -3至3X10 18 cm -3的各种气相外延生长的GaAs0.62P0.38衬底,并依次沉积1000埃的Al2O3和SiO2的SiO2通过CVD法在基板上形成2000埃的膜,形成离子注入窗,并以1×10 14 cm -3注入50KeV的Zn离子。之后,通过在磷气氛下进行650℃,30分钟的退火,可以得到光检测面积为1.05mm 2的光电二极管。如此获得的二极管在零偏压下的结电容,由此计算出的耗尽层的宽度以及p-n结的深度如表1所示。

著录项

  • 公开/公告号JPS5459361A

    专利类型

  • 公开/公告日1979-05-12

    原文格式PDF

  • 申请/专利权人 BORUKANO SHIYOKUHIN KOUGIYOU K;

    申请/专利号JP19770125315

  • 发明设计人 NIWA SADAO;

    申请日1977-10-18

  • 分类号A23B4/00;A23B4/12;A23B4/14;

  • 国家 JP

  • 入库时间 2022-08-22 21:14:59

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