NEW MATERIAL:Title compound of formula I [R1 is lower alkyl; R2 is -(CH2)m- where m is 3 - 10 and these alkylenes may be substituted with lower alkyl and/ or phenyl; n is 1 - 3]. EXAMPLE:4-(Dimethylvinylsilyl)-butanol. USE:Starting material of high-performance electron-sensitive material useful for manufacturing high-density integrated circuits, hologram memories. PREPARATION:For example, the hydroxly group in chlorohydrin of formula II (mis 4 - 10) is protected with a groups stable against Grignard reagents as trimethylsilyl group to form a compound formula III, which is reacted with Mg to prepare the Grignard reagent. Then a chlorosilane of formula IV is reacted with the Grignard reagent and simultaneously trimethylsiloxy group is hydrolyzed to produce the objective compound of formula I including formula V (m is 1 - 10).
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机译:新材料:式I [R 1]的标题化合物为低级烷基; R 2为-(CH 2)m-,其中m为3-10,并且这些亚烷基可以被低级烷基和/或苯基取代; n为1-3]。实施例:4-(二甲基乙烯基甲硅烷基)-丁醇。用途:高性能电子敏感材料的起始材料,可用于制造高密度集成电路,全息图存储器。制备:例如,式II的氯醇中的羟基(4-10)用对格氏试剂稳定的基团作为三甲基甲硅烷基进行保护,形成式III的化合物,该化合物与Mg反应制备格氏试剂。然后使式IV的氯硅烷与格氏试剂反应,同时三甲基甲硅烷氧基水解以产生包括式V的式I的目标化合物(m为1-10)。
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