method and arksæt to manufacture one for the projection suitable billedark.

• 1. 一种基于勒让德傅立叶多项式的圆柱干涉拼接方法和系统 [P] . 中国专利： CN106802136B . 2019.07.23
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• 3. APPARATUS FOR PROJECTION EXPOSURE SUITABLE FOR REPETITIVE EXPOSURES FOR FORMING A PATTERN, A METHOD FOR PROJECTION EXPOSURE BY USING THEREOF, A METHOD OF MANUFACTURING AN EXPOSED MEMBER, AND A SEMICONDUCTOR DEVICE COMPRISING COLUMNS OF THE EXPOSED PATTERN [P] . 韩国专利： KR20040070038A . 2004-08-06

  机译： 适用于形成图案的重复性曝光的投影曝光设备，一种使用其的投影曝光方法，一种制造曝光成员的方法以及一种包括曝光模式列的半导体装置

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  机译： 适合与不同浸泡液一起使用的投影透镜及其转换方法和制造方法

• 5. Selective projection limiting method suitable for use in manufacturing floating gate transistors [P] . 日本专利： JP2942576B2 . 1999-08-30

  机译： 适用于制造浮栅晶体管的选择性投影限制方法

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