首页> 外国专利> Silver halide photographic material - with antistatic coating contg. unsaturated carboxylic acid fluorinated alkyl ester polymer

Silver halide photographic material - with antistatic coating contg. unsaturated carboxylic acid fluorinated alkyl ester polymer

机译:卤化银照相材料-带有抗静电涂层。不饱和羧酸氟化烷基酯聚合物

摘要

A photosensitive material comprises a support coated on =1 surface with =1 Ag halide photographic emulsion layer coated in turn with a top layer comprising an F-contg. (co)polymer. The latter is derived from a fluorinated alkyl (opt. branched) ester of an ethylenically unsatd. carboxylic acid. The fluorinated alkyl group contains no more than one H or Cl for 2C atoms and one O or N for 2C atoms. The polymer may be present on its own or, besides the top layer, it may be incorporated in one or all emulsion layers or in an intermediate layer between the support and the emulsion layer. The polymer prevents the accumulation of static charges when the material is processed, partic. in high speed radiographic appts. Formation of static streaks on films is thus avoided.
机译:光敏材料包括涂覆在> = 1表面上的支撑体,该支撑体上涂覆有> = 1的卤化银照相乳剂层,依次用覆盖有F-contg的顶层涂覆。 (共)聚合物。后者衍生自烯键式不饱和的氟化烷基(最佳支链)酯。羧酸。该氟化烷基的2C原子数为1个以下的H或Cl,2C原子数为1个以下的O或N。聚合物可以单独存在,或者除顶层外,还可以掺入一层或全部乳液层中,或掺入载体和乳液层之间的中间层中。聚合物可防止材料在加工过程中累积静电。在高速射线照相设备中。因此避免了在膜上形成静电条纹。

著录项

  • 公开/公告号FR2402228A1

    专利类型

  • 公开/公告日1979-03-30

    原文格式PDF

  • 申请/专利权人 MINNESOTA MINING MANUFACTURING;

    申请/专利号FR19770026411

  • 发明设计人

    申请日1977-08-31

  • 分类号G03C1/82;

  • 国家 FR

  • 入库时间 2022-08-22 19:33:27

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