首页> 外国专利> Planar semiconductor diode with diffusion zone metallised contact - has second silicon oxide layer with window with metal coating including aluminium and nickel films

Planar semiconductor diode with diffusion zone metallised contact - has second silicon oxide layer with window with metal coating including aluminium and nickel films

机译:带有扩散区金属化接触的平面半导体二极管-带有第二个氧化硅层,第二个氧化硅层带有带有铝和镍膜金属涂层的窗口

摘要

The planar semiconductor diode is designed as a zener diode. It consists of a semiconductor substrate of one type of conductivity with a diffusion zone of the opposite type. The diffusion zone is contacted by metallisation. The lower side of the disc (1) has a second silicon oxide layer (3) with a second window (5). This window is coated with a layer of metal. The metallisation (8, 9, 10) extends over the window on the top surface and the bottom surface. A lead layer (11) is deposited on the metallised sections. The metallisation may include aluminium and nickel films.
机译:平面半导体二极管设计为齐纳二极管。它由一种导电类型的半导体衬底和相反类型的扩散区组成。扩散区通过金属化接触。盘(1)的下侧具有带有第二窗口(5)的第二氧化硅层(3)。该窗口涂有一层金属。金属化层(8、9、10)在窗口的顶表面和底表面上延伸。铅层(11)沉积在金属化部分上。金属化可以包括铝和镍膜。

著录项

  • 公开/公告号DE2838605A1

    专利类型

  • 公开/公告日1980-03-06

    原文格式PDF

  • 申请/专利权人 ROBERT BOSCH GMBH;

    申请/专利号DE19782838605

  • 发明设计人 TOMCIVANA;

    申请日1978-09-05

  • 分类号H01L29/86;

  • 国家 DE

  • 入库时间 2022-08-22 17:35:43

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