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Passivation of metallic surfaces in order to avoid an undesirable deposits of currentless coppering operating springs bae

机译:金属表面的钝化,以避免不必要的无电流镀铜工作弹簧堆积

摘要

The metallic surfaces of plating equipment in use during electroless copper deposition, such as vessels 2, racks 26 supporting substrates 24 to be plated, plumbing are rendered substantially resistant to electroless copper deposition for extended periods by initially imposing on such equipment surfaces an electrical potential via power supply 10 more positive than the mixed potential of the electroless copper deposition solution and sufficiently positive to resist electroless deposition. The workpiece substrate 24 is insulated from rack 26 by non-conductor 27. The electrical potential supplied by electrode 6 and the vessel walls 12a, 12b, is monitored during the electroless plating using reference electrode 22. IMAGE
机译:在化学镀铜过程中使用的镀覆设备的金属表面,例如容器2,支撑待镀基板24的机架26,管道,通过首先在这样的设备表面上施加电势,从而使其在较长时间内基本上抗化学镀铜。电源10比化学镀铜溶液的混合电位更正,并且足以抵抗化学镀。工件基板24通过非导体27与齿条26绝缘。在使用参考电极22的化学镀期间,监测由电极6和容器壁12a,12b供应的电势。

著录项

  • 公开/公告号DE3016994A1

    专利类型

  • 公开/公告日1980-11-06

    原文格式PDF

  • 申请/专利权人 KOLLMORGEN TECH CORP;

    申请/专利号DE19803016994

  • 发明设计人 ZEBLISKY RUDOLPH JOSEPH;

    申请日1980-04-30

  • 分类号C23C3/02;

  • 国家 DE

  • 入库时间 2022-08-22 17:28:39

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