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Method of pattern forming in a photosensitive composition having a reciprocity law failing property
Method of pattern forming in a photosensitive composition having a reciprocity law failing property
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机译:具有互易律失效特性的光敏组合物中的图案形成方法
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摘要
The present invention relates to a novel light sensitive photoresist composition which is used for the photo-engraving process or for production of phosphor screen of color picture tubes. The light sensitive photoresist composition of the present invention comprises a novel water- soluble aromatic azide compound and a photo-crosslinkable water-soluble polymer.
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