Process comprises (i) providing patterned protective layer, which is made of hardened layer of photohardening organopolysiloxane, on silicone layer coated on support; (ii) rendering specific areas of the silicone layer, where the protective layer is absent, oleophilic using active chemical species existing in plasma state; and (iii) peeling the protective layer off the silicone layer surface. Photohardening organopolysiloxane has surface tension of pref. 20-23 dyn/cm. Organopolysiloxane itself may have sensitive to light, or mixt. of silicone resin and light sensitive substance may be used for making protective layer. Thickness of protective layer is 1-5 mu m. Light sensitive organopolysiloxane is e.g. organopolysiloxane having siloxane unit to which maleimido, acryloxy, amido etc. is attached. Light sensitive substance to be mixed with silicone resin is e.g. azide, o-quinonediazide, cinnamic acid etc. Wettability of material for protecting layer to silicone layer is improved without lowering resolving power of light sensitive resin contained in the protective layer.
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