首页> 外国专利> fotometer for anvendning in photometric tjockleksmetning of optically thin layers during the construction of vakuumbestrykningsanleggningar

fotometer for anvendning in photometric tjockleksmetning of optically thin layers during the construction of vakuumbestrykningsanleggningar

机译:照相光度计,用于在光变层的构造过程中对光学薄层进行光度测量

摘要

An arrangement and photometer for measuring and controlling the thickness of optically active thin layers wherein the axis of the measurement light beam coming from the measurement light source is directed to the measurement object and a referenced light receiver, independent of the optical properties of the measurement object, is associated with the measurement light beam. The output signal of the referenced light receiver is mixed with a trigger stage for a phase sensitive photometer amplifier and is fed to a compensation circuit for the equilization of brightness variations in the measurement light source.
机译:一种用于测量和控制光学活性薄层厚度的装置和光度计,其中,来自测量光源的测量光束的轴指向测量对象和参考光接收器,而与测量对象的光学特性无关与测量光束相关联。参考光接收器的输出信号与用于相敏光度计放大器的触发级混合,并馈入补偿电路,以均衡测量光源中的亮度变化。

著录项

  • 公开/公告号SE8204900D0

    专利类型

  • 公开/公告日1982-08-27

    原文格式PDF

  • 申请/专利权人 LEYBOLD-HERAEUS GMBH & CO KG;

    申请/专利号SE19820004900

  • 发明设计人 H * SCHWIECKER;G * THORN;H-P * EHRL;

    申请日1982-08-27

  • 分类号G01B11/06;G01N21/45;

  • 国家 SE

  • 入库时间 2022-08-22 13:30:54

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