COPPER PHYSICAL DEVELOPMENT USING HETEROCYCLIC LIGAND COPPER(I) COMPLEXES

摘要

Abstract of the DisclosureCopper physical development using certain hetero-cyclic ligand copper(I) complexes which are resistant toaerial oxidation is disclosed. The copper(I) complexescan be represented by the formulaL(CuX)mwherein L is a monodentate or bidentate heterocyclic ligand,X is an anion and m is the integer l or 2. The describedphysical development compositions can operate in either thedisproportionation mode, in which case the compositionfurther comprises, in addition to the copper(I) complex,a ligand for copper(II); or in the reduction mode, in whichcase the composition further comprises a reducing agent andpreferably a tase. Generally, nuclei of metals from groupVIII and IB of the periodic table are catalytic for thedeposition of copper from these compositions. The nucleican be imagewise formed by exposing an electromagneticradiation sensitive compound. Physical development formula-tions, processes and elements are disclosed.