首页> 外国专利> Polishing appts. for small mineral samples e.g. dust particles - has rotatably mounted sample carrier, perpendicular to and below polishing surface, which can be bought under telescope

Polishing appts. for small mineral samples e.g. dust particles - has rotatably mounted sample carrier, perpendicular to and below polishing surface, which can be bought under telescope

机译:抛光装置。用于小矿物样品,例如灰尘颗粒-垂直于抛光面并在抛光面下方可旋转安装的样品架,可在望远镜下购买

摘要

The device contains a sample-holder placed on a support mounted on a carriage moving along fixed guiding rails. The position of the support can be adjusted vertically and horizontally. The carriage moves between two positions. In one position, the sample-holder is placed exactly under a polishing plate rotating round a vertical axis. In the other position, the sample-holder is placed exactly under the lens of a microscope which is mounted on a fixed support. With this device, the polishing can be easily and better controlled as the sample is instantly located after each polishing phase. Furthermore the polishing cannot go beyond a predetermined level. To each adjustment element is associated a measuring scale.
机译:该设备包含一个放置在支架上的样品架,该支架安装在沿着固定导轨移动的支架上。支架的位置可以垂直和水平调节。滑架在两个位置之间移动。在一个位置,将样品架恰好放置在绕垂直轴旋转的抛光板下面。在另一个位置,将样品架恰好放置在安装在固定支架上的显微镜透镜下面。使用该设备,可以轻松,更好地控制抛光,因为样品在每个抛光阶段之后都会立即定位。此外,抛光不能超过预定水平。每个调节元件都带有一个测量刻度。

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