A method for producing a photographic image from a photosensitive photographic silver halide material from the lippmann - type

摘要

PURPOSE:To obtain a mask for manufacturing an integrated circuit with high resolving power and accuracy by adding a specified compound to a Lippmann type silver halide emulsion by a specified amount basing on the amount of the silver halide and by carrying out development with a developer contg. SO-3 at a certain concn. or above. CONSTITUTION:A photosensitive material having a Lippmann type emulsion layer contg. a compound represented by formulaI, especially a compound represented by formula II, III by =3.5X10-3mole per 1mole silver halide is manufactured. In the formulaI, Z is a group of atoms required to form a (substituted) heterocyclic ring which may have a condensed ring, Y is H or -S-R1, each of R and R1 is H, an alkali metal, NH4 or (substituted) alkyl, each of X and X1 is a bivalent org. group, each of m and m1 is 0 or 1, n is 0-3, and in case of n=0, Y is -S-R1. The photosensitive material is developed with a developer contg. =0.6mol/l SO3-. Thus, an image with high density, superior resolving power and accuracy is obtd.