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A METHOD OF APPLYING AN ANTIREFLECTIVE COATING ON SILICON AND A COATED SILICON CHIP THEREBY OBTAINED
A METHOD OF APPLYING AN ANTIREFLECTIVE COATING ON SILICON AND A COATED SILICON CHIP THEREBY OBTAINED
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机译:获得了一种在硅上施加抗反射涂层的方法,从而获得了一种涂层硅芯片
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摘要
The PN juncture in a silicon chip and an oxide coating on its surface are simultaneously formed from clear solution derived from titanium alkoxides, water, alcohol, a suitable acid, and a P or N dopant compound by partial hydrolysis and polymerization. The solution is applied to the surface of a silicon chip. The chip is then heated which converts the solution to a solid oxide coating which meets the antireflective optical film requirements and induces the migration of the dopants into the chip, forming a PN junction in the chip. The method also provides deep and uniform junction formation or diffusion without resulting in excessive carrier concentration.
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